Innovative add-on accessory injecting gaseous precursors for beam-induced deposition and gas-assisted etching (GAE) of materials in Focused Ion Beam (FIB) and Focused Electron Beam (FEB) instruments, including dual-beam Focused Ion Beam - Scanning Electron Microscope (FIB/SEM) tools.

Distinct features of GALEX Instruments GIS are extremely quiet operation and highly controlled gas flow free of pressure bursts. GIS is constantly conditioned and always ready for operation, without the need for outgassing, purging, or any other daily maintenance. Programmed cleanup feature completely eliminates chemical memory in applications critical to even slightest level of cross-contamination.

FIB/SEM Deposition GIS - released during Microscopy and Microanalysis 2018; available to order; live demo upon request, application examples below:

FIB/SEM Gas-Asisted Etching (GAE) Injection System - to be released at Microscopy & Microanalysis 2019.

 
Gas Injection

• View Deposition GIS Specifications
• View Etching GIS  Specifications

Temperature Control (Only one Peltier stage)

You can find us:

Web: www.partbeamsystech.com

Web: www.freudlabs.com

E-Mail: info@partbeamsystech.com

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Disclaimer:

MEO Engineering Company, Inc., D.B.A. "PBS&T" ("Particle Beam Systems and Technology") provides range of technological solutions, including third-party service, support, parts, and consumables for FIB, SEM, and dual-beam FIB/SEM instrumentation. PBS&T does not represent, not affiliated with, and not supported by OEMs of FIB, SEM, and FIB/SEM instrumentation. All trademarks identifying supported FIB, SEM, and FIB/SEM equipment and components are property of their respective owners and nominatively used for the sole purpose of accurately identifying equipment compatible with the parts and services provided by PBS&T, MEO Engineering Company, Inc.